LIQUID VAPORIZER SYSTEM (SLVS-4410)

Keywords: CVD, MOCVD, ferroelectrics, high-k, BST, PZT
General Description:

The Shimadzu Liquid Vaporizer System accurately and precisely mixes liquid chemical precursors and then quickly co-vaporizes them for delivery to a Chemical Vapor Deposition (CVD) process chamber. This technique is a vital enabling technology required to deposit new high permittivity (high-k) films such as BST for high density DRAM and ferroelectric films such as PZT for non-volatile memory.   The system includes three liquid reservoirs for precursors and one additional reservoir for solvent. Liquid mass-flow controllers are used to meter precursors and solvents. A heated spray chamber instantly co-vaporizes the precursors and solvents for delivery to the CVD with minimal residue. All liquid delivery lines use computer controlled automated

valves and programmed sequences for operation, purging, reservoir refilling, chemical changeover, etc.   The advantages of the Shimadzu SLVS-4410 include: Production Worthy Design – normal operation and routine maintenance for zero downtime because of vaporizer clogging. Wide Temperature Range with Accurate Temp Control – vaporizer temperature is user-settable to 300C with actual temperature matching the setpoint. Advanced Research and Production Capable – fully automated control of up to three liquid precursors and one solvent allowing true processing capability for three-component systems such as BST and PZT. Pre-mixing is not necessary.